
Lower failure costs by creating consistency in manufacturing sites
With the cost of failure increasing in manufacturing, large semiconductor producers like Intel, Samsung and TSMC have high expectations for their materials suppliers to adequately develop and maintain systems to improve quality.
To meet these needs, leading electronic chemical and materials providers' operations span multiple production facilities across global geographies. Multisite operations make qualification in a semiconductor process expensive and lengthy.
Differences between manufacturing sites are often not discovered unless a detailed and expensive qualification process is undertaken, or as the result of a product excursion discovered by an end user.
Introducing Linx Semiconductor Manufacturing Alignment Service
Linx is introducing a new service to help chemical and materials suppliers lower failure costs by aligning their manufacturing facilities to reduce failure costs by creating consistency across all manufacturing facilities.
Linx Semiconductor Manufacturing Alignment Service includes:
- On-site audit of at least two manufacturing facilities or existing HVM vs. BCP plan.
- In process evaluation
- Excursion containments
- Customer response evaluation
- Report Out of Findings
- Summary of system as is in each facility
- Outline of key differences in each facility
- Comparison of system relative to best known industry methods
- Recommendations for Gap Closure
- Risk ranking of gaps identified
- Prioritization of gaps working with key customer staff
Low Cost and Fast Turnaround
The Linx Semiconductor Manufacturing Alignment Service is designed for fast implementation so suppliers can start improving operations and lowering failure costs in as little as a month. The sooner your facilities are aligned, the more your company will save in the long run. Pricing starts at around $10,000, depending on the number of facilities.
To learn more about the Linx Semiconductor Manufacturing Alignment Service, call Kyle Flanigan at 503-519-8776 or email him.