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May 2013
The Electronic Materials Report  
Advanced Thin Films Now Available - 4th Edition
Initiating CMP Service - 5th Edition
NOW AVAILABLE - Advanced Thin Film Processes & Materials for FEOL and Interconnect Applications, 2012-2017
In the 4th edition of Advanced Thin Film Processes & Materials for FEOL and Interconnect Applications, the industry is facing challenges in its path to continue scaling, which is leading to the adoption of many new structures as well as new materials, including: 
  • Logic devices converting to FinFETS, and eventually FinFETs with high mobility channels 
  • Rapid growth in novel metals gates and high-κ gate dielectrics
  • Rapid growth in spacers used in lithography for pitch doubling applications
  • Next generation barrier and seed materials
  • High-K dielectrics and 3D structures in NAND 

The growth of novel thin film precursors used in these emerging applications, segmented by deposition technology, is illustrated below:

  

Thin Film Deposition Growth ($Basis)    

Thin Film Deposition 

Advanced Thin Film Processes & Materials for FEOL and Interconnect Applications, 2012-2017 predicts the market for advanced precursors will reach to $3B by 2017. This growth in advanced precursors is driven by the challenge to continue scaling and represents significant opportunity for chemicals and materials suppliers, OEMS, and other technology developers.

 

For more information or to request a quote for Advanced Thin Film Processes & Materials for FEOL and Interconnect Applications, 2012-2017, call Mike Corbett at 973-698-2331.
INITIATING: CMP Consumables & Specialty Abrasives Service

Linx is initiating a three part CMP Service- The CMP Consumables and Specialty Abrasives Research Service

 

The CMP Consumables and Specialty Abrasives Research Service is an industry analysis service that is designed to help planners and market participants succeed in the CMP market and the associated value chain.

  

The service consists of three reports:
  • Report I - CMP Markets and Technologies for the 11/10nm Node 

    (5th edition) 

    In this report, we survey the CMP material growth for slurries and pads in wafer fab processing. We review applications (by device process module and technology node) and suppliers, and conclude with an analysis of business opportunities.  
  • Report II - Specialty Abrasives for CMP 

    (3rd edition)


    This report analyzes emerging CMP processes and materials with emphasis on the trends for abrasives. Additionally, we forecast abrasive demand using the Linx Materials Models, assess key suppliers, and analyze potential business opportunities.  
  • Report III - Emerging Applications in CMP: TSV and Wafer Thinning TSV offers the potential to reduce device footprint and increase functionality. In this report, we present the key drivers for TSV and survey the different approaches to the technology. The relevant CMP consumables for front side and backside applications and major market participants, as well as potential business opportunities are described. 
  • Report Schedule

  • The report will be published in the 4th quarter 2013 with Report 1 scheduled for October, Report II in November, and Report III in December.

      

    For more information or to pre-order The CMP Consumables and Specialty Abrasives Research Service, call Mike Corbett at 978-698-2331 or email us.

    Mike Corbett & Mark Thirsk
    Linx Consulting
    www.linx-consulting.com
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