May 2014
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Welcome to the May edition of the Dassault Systèmes ENOVIA® Collaborative Innovation (CI) Community newsletter featuring Pratt &Whitney Canada, ARC Advisory Group, a recap of our ENOVIA User Days in Russia and India, newly announced global events, and much more!

 

Arming you with knowledge and connections, CI Community members consist of customers, partners and product experts who are committed  to maximizing your investments with ENOVIA.

 

Not a member yet? Simply click here and register. Don't forget to share the link with your colleagues so they too can join the CI Community and contribute their insight and experience with ENOVIA.

 

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Regards,

 

-Your ENOVIA team                                                                        (For maximum performance, please use Chrome, Safari or Firefox!)
In this Issue
Why Design Data Management and Analytics
Navigating the Ocean of Global Requirements
Deployment Status: Pratt & Whitney Canada Enterprise-wide IP & Export Control
ENOVIA Community Conference 2014
ARC Advisory Group on ENOVIA
India User Event- Day of Discussion, Interaction and Success!
Russia User Day - Recap of a Successful Event
DS ENOVIA Upcoming Events!
 
June 1-5, 2014
San Francisco, CA
 
June 2-3, 2014
Tokyo, Japan
 
June 5, 2014
Beijing, China
 
July 17-18, 2014
Boston, MA
 
Stay Notified of Community Activity

 

Visit this link for instructions on how to receive notifications whenever any new activity occurs in the online Collaborative Innovation Community.
Why Design Data Management and Analytics aren't
 just ordinary Big Data
 
 
 

 Dassault Systèmes very own member of the High-Tech Industry team, Eric Rogge shares his thoughts on analytics, big data and the role it plays in semiconductor design closure.  

Read the Story Now!

Navigating the Ocean of Global Requirements
 
 
 

How fast can you adapt to ever-changing materials compliance regimes? Find out now by visiting our 3DS website and downloading the whitepaper. 
Deployment Status: Pratt & Whitney Canada Enterprise-wide IP & Export Control - A Customer Story
 
Pratt & Whitney Canada (P&WC) shares its enterprise-wide IP & Export Control Program. Find out the business need, solution requirements and the Proof of Concept study that helped P&WC choose Dassault Systèmes solution. 

 

You will also learn the project status and expected benefits. Cont'd...
ENOVIA Community Conference 2014 - A Great Event!

The recent ENOVIA community conference held in Seoul, Korea on May 15, 2014 was met with great attendance (over 350 people!) by many customers, partners and of course, the DS team. 
 
This all day event saw various speakers sharing their success stories with ENOVIA, their views of the value-add through use of ENOVIA and other testimonials as well from the likes of DaiNippon Screen and other sessions sponsored by HP and DELL. Read the Story
  1. ARC Advisory Group on ENOVIA: 
 
"Fine-grain data management makes it more efficient to access and exchange design information"
 

 

Executives from Dassault Systèmes recently provided ARC Advisory Group with an update with an update on the company's collaborative product data management (PDM) solution.

Andy Kalambi, CEO of the ENOVIA brand, presented an overview of business for the last year (2013) and the top revenue contributors in terms of customers and industries. Kalambi pointed to several significant new customers in industry sectors such as CPG, food and beverage, and healthcare. Read the Story Now!

 
India User Event - Day of Discussion, Interaction and Success!

The first ENOVIA Community Conference in India was held on May 9, 2014 in New Delhi. This successful event saw more than 50 customer and prospects along with people from Dassault Systèmes and its partner ecosystem.
 

Andy Kalambi, CEO ENOVIA presented to the audience and was followed by other speakers. Read the Story

Russia User Day - Recap of a Successful Event

The first ever ENOVIA User Day was held in Russia. April 1st - 3rd, 2014. The space was filled with 80 customers from various industries, a variety of channels sales partners, IT directors, project managers, engineers and more...all excited to hear the ENOVIA stories and what is new and exciting about the R14x release. Cont'd
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Thank you for your valued CI Community membership and participation! We look forward to your contributions, opinion, questions, and ongoing feedback.   

 

 

Sincerely,