A Decade of Materials
|Linx Consulting presented a white paper entitled EMERGING MATERIALS IN ADVANCED DEVICES at the recent Strategic Materials Conference in Half Moon Bay, CA. |
The presentation began with a review of changes over the last 10 years:
The paper reviewed the last decade of electronic materials and discussed whether this last decade was in fact The Decade of Materials. The paper also discussed changes in FEOL, BEOL and memory cell structures and concluded that materials enabled continued industry growth more than Moore:
1. Opportunities and innovations attract the largest newcomers, including:
2. Materials provide key technologies
3. Materials enable continuation of Moore's Law:
- High-K gate dielectrics
- Litho alternatives
The paper outlined future industry requirements and how current technologies that have been developed over the last decade can provide stop-gap solutions until newer technologies, such as EUV lithography are ready. In addition, it discussed the impact of new costs device producers are facing and how cost may push the industry to 450 mm wafers:
To see the entire paper, visit our website.
|Linx Industry Analysis Reports Underway|
Advanced Thin Films For FEOL and BEOL Applications
We are almost finished with the third edition of this report that tracks CVD, ALD, PVD and advanced SOD precursors, applications and markets.
Learn more about Advanced Thin Films for FEOL & BEOL Applications.
Advanced Patterning Materials
Linx is pleased to announce a new service covering spin-on patterning materials including photoresists and patterning ancillaries called the Patterning Material Forecast Service. This service is critical to lithography materials suppliers as the number of masks is expected to increase substantially over the next few years.
|For more information about our Linx reports, call 617.273.8837 or send us an email.|