News: Harvard Accepts the Elionix ELS-7000 EBL System  Harvard researchers recently accepted the Elionix ELS-7000 100kV Electron Beam Lithography system at the Center for NanoScale Systems (CNS). The 100kV system is capable of writing fine patterns of 8nm, and minimizing proximity effects that occur when writing small patterns. The latest CNS NanoWire Newsletter (pdf) states the following regarding the ELS-7000 installation, "During the installation we were able to write finer lines, measuring 5nm, than what the manufacture specifies, 8nm." The instrument is located in LISE G07, the new cleanroom on the ground floor of the LISE building at Harvard. |
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Duke Writes First Patterns with the ELS-7500EX  Duke University has intalled and is now writing initial patterns on their 50kV Elionix ELS-7500EX Electron Beam Lithography system. The EBL system is installed at Duke's Shared Materials Instrumentation Facility (SMIF). SMIF's mission statement is to provide researchers with high quality and cost-effective access to advanced material characterization and fabrication capabilities. Pictured is a 20nm hole/100nm pitch pattern generated from an Elionix ELS-7500EX.
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Penn Installation of the ELS-7500EX Completed  Installation of the Elionix ELS-7500EX has just been completed at the University of Pennslvania. The system will be operating at the Penn Regional Nanotechnology Facility that is equipped with a wide range of state-of-the-art instrumentation. The Nanotech Facility is setup to accommodate both academic and corporate users so ease of use was a critical selection factor. Pictured is the ELS-7500EX Graphical User Interface. |
